ELI systems

The ELI series systems are a high-tech solution for precision evaporation of materials in a vacuum. They can be used to sputter metals, semiconductors, and their refractory oxides, nitrides, carbides, and other compounds. ELI reliably handles materials that are difficult to evaporate using other methods. How does it work? The system is based on an electron gun. A powerful stream of electrons is focused into a narrow beam and directed precisely into the crucible containing the material. The kinetic energy of the beam is instantly converted into heat, heating the material to evaporation temperature. Key Advantages

• Works with any materials: The system easily handles refractory compounds.

• Clean process: Thanks to the 270° beam rotation system, the electron source is protected from vapors of the evaporated material. This extends the service life of the cathode and ensures sterile sputtering.

• Precise control: The electromagnetic system allows for rapid beam deflection and movement along the X and Y axes, ensuring uniform heating of the material.

• Efficient cooling: A sophisticated cooling system effectively reduces thermal loads on the crucible and copper bases, preventing overheating even during intensive operation. Technical flexibility We offer two basic models that can be tailored to your production needs: Model Features VTT-ELI-6: A compact solution for standard deposition cycles. VTT-ELI-8: ​​An enlarged crucible for handling larger volumes of materials. Crucible configuration: Upon customer request, both models can be equipped with either single-position or multi-position crucibles for sequential deposition of different materials in a single cycle.