Targets

Technological Targets and Cathodes The target (or cathode) is the basic element of the vacuum process, serving as the direct source of material for the formation of a thin-film coating. It is from the target (or cathode) that atoms are ejected by ion bombardment or arc discharge, transported in a vacuum, and condensed on the surface of your parts. Material quality is the key to a perfect layer. When supplying targets, we guarantee:

• High purity (from 99.9% to 99.999%): The absence of foreign impurities eliminates defects in the film structure.

• Uniform fine-grained structure: Ensures a stable evaporation rate and prevents material “micro-splashes.”

• High density: The absence of internal pores and gas inclusions allows us to achieve ultimate vacuum without excess gas evolution. A Wide Range of Materials Depending on the required coating properties (wear resistance, electrical conductivity, color, or corrosion resistance), we offer targets made of various metals and alloys:

• Titanium (Ti) and Zirconium (Zr): Base materials for creating superhard nitride coatings (TiN, ZrN) in gold and silver colors.

• Chromium (Cr): Ideal for mirror, decorative, and anti-corrosion layers.

• Aluminum (Al) and Copper (Cu): Used to create conductive layers and mirror reflectors.

• Alloys (TiAl, CrNi, etc.): Allow for the creation of gradient and multilayer coatings with unique physical and mechanical properties. Design Options We manufacture and supply consumables for all types of our evaporators: 1. Rectangular Targets: For standard magnetron sputtering devices. 2. Point cathodes: For point-type arc evaporators. 3. Extended (rectangular) targets: For large-area systems and continuous cycles. Utilization efficiency Thanks to the synergy of our power supplies (BPM and BPDI series) and precision targets, we achieve material utilization rates up to 30-40% higher than standard systems, due to uniform erosive wear across the entire target surface.