Vacuum line VTT-PLASMA-M2-IS1 It is intended for drawing in vacuum of thin-film coverings Cr on substrates from glass магнетронным in the way with preliminary clearing by an ionic source and heating.
Vacuum installation of new generation on the basis of cryogenic pumping of VTT-OPTIC-ELI-2-IS1 is intended for drawing in vacuum of optical multilayered thin-film coverings by an electron beam and resistive mode with preliminary cleaning of a surface of substrates by an ion bunch, and also with possibility of ion assistance and heating of substrates.
Read more: VACUUM INSTALLATION FOR DRAWING OPTICAL COVERINGS VTT-OPTIC-ELI-2-IS1.
Vacuum installation VTT-PLASMA-M3-IS1 for drawing in vacuum of thin-film coverings Al on substrates from Si magnetronic in the way with preliminary clearing by an ionic source.
Vacuum installation VTT-KASKAD-DUO is intended for drawing of strengthening, protectively-decorative coverings by a method magnetron and electro-arc dispersion from electrowire refractory materials (Ti, Mo, Zr, etc.).
Vacuum installation is intended for drawing in vacuum of coverings from various materials on a powder material, in particular graphite, with preliminary heating and ionic cleaning.
Read more: INSTALLATION OF THE VACUUM DUSTING ON POWDER MATERIAL UVPM.
Installation of ionic-plasma drawing of covering VTT-PLASMA-COG is intended for drawing of wearproof, korrozionno-proof, protectively-decorative coverings (metal, nitrides, oxides, carbides etc.) on various metal wares and a number диэлектриков. The basic appointment - a protectively-decorative dusting of tooth artificial limbs and hardening мелкоразмерного the tool.
